Abstract:The hollow SiO2 microspheres were prepared through the hard template method and sol-gel method by using self-made polystyrene (PS) as template, cetyltrimethyl ammonium bromide (CTAB) as cationic surfactant and Tetraethyl orthosilicate (TEOS) as silica source. Effects of heating rate, content of CTAB, TEOS and ammonia on the morphology of hollow SiO2 microspheres were discussed. The phase, morphology and mesoporous structure of hollow SiO2 microspheres were characterized by XRD, TEM, SEM, TG and FTIR, which shows the successful preparation of hollow silica sphere. The particle sizes of hollow SiO2 microspheres are 2-5 μm and the thickness is 117 nm. The hollow SiO2 microsphere wall damage with the increase of heating rate. With increasing CTAB content, the number of nanospheres increase and the particle sizes of nanospheres decrease. With increasing TEOS content, the thicknesses of spheres increase until nanospheres are formed. When ammonia is less than 4 mL, hollow SiO2 microsphere cannot be formed. When ammonia is greater than 4 mL, hollow SiO2 microsphere have rough surface with solid particles. The optimized conditions are determined as follows: the heating rate is 0.5 ℃/min, the amount of CTAB is 0.05 g, the amount of TEOS is 0.3 mL, the amount of ammonia is 4 mL and then hollow SiO2 microspheres are treated through filtering and cleaning.
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